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主要題名:A calculation of microwave power in a MPCVD system using 2-D Gaussian mixture modeling
作者姓名:Lin, Chii-RueyLin, Chun-YeonJhuang, June-YenHsu, Chih-MingSu, Chun-Hsi
摘要:The microwave plasma chemical vapor deposition (MPCVD) method has been widely used in several industry applications. The plasma modeling and control issues play an important role in MPCVD systems. One of crucial factors in controlling plasma shape and position is the tunable reflected microwave power of the MPCVD system. However, modeling the tunable reflected power of microwave plasma is highly complex and remains as a poorly understandable information. In this paper, the reflected power distribution corresponding to the adjustable electromagnetic field can be reduced as a 2D scattered plot by using 2D histogram projection and then be modeled in a mathematical expression through the 2D Gaussian mixture modeling (GMM). The estimated results of calculation show that microwave power data can be simplified to be a linear combination of some Gaussian functions that provides a predictable and controlled basis for tuning manufacturing parameters and plasma sharp in a real-time control.
貢獻者資料:機電學院/機電科技研究所
論文ID:10205-en-pc-2007-10_1p
典藏單位:國立臺北科技大學
數位物件檔名:10205-en-pc-2007-10_1p.pdf
發行日期:2007-10
統一資源識別號:http://dx.doi.org/10.1109/ICSMC.2007.4413681
註:©2007 IEEE
資料開放狀態:開放
研討會:Systems, Man and Cybernetics, 2007. ISIC. IEEE International Conference on,7-10 Oct. 2007, Montréal, Canada
論文起迄頁碼:pp3006 - 3010